Articles for tag: Gate Oxide Thickness, Semiconductor technology, Silicon Devices, Subthreshold Effects, Transistor Leakage

December 11, 2024

Gate-Induced Drain Leakage (GIDL): Understanding Another Subthreshold Effect

Discover what Gate-Induced Drain Leakage (GIDL) is, how it affects semiconductor devices, and its impact on modern electronics. Learn about this crucial subthreshold effect.

December 11, 2024

Eroch Moraguez

Glossary and Terminology

Depletion Approximation: Simplifying MOS Capacitor Analysis for Designers

Learn how Depletion Approximation simplifies semiconductor device analysis, enabling efficient MOS capacitor design through accurate charge carrier modeling and practical calculations.

Gate-Induced Drain Leakage (GIDL): Understanding Another Subthreshold Effect

Depletion Approximation: Simplifying MOS Capacitor Analysis for Designers

Secure Key Storage: Transistor-Based Hardware Roots of Trust

Noise Immunity Essentials: Transistor Filters for Clean MCU Signals

Signal Integrity Under Pressure: Transistor Buffering for Harsh Industrial Environments